This standard was transferred to SEMI (www.semi.org) May 2003.

1.1 This test method covers the determination of total trace boron contamination in the bulk of single crystal, heavily doped n-type silicon substrates using secondary ion mass spectrometry (SIMS).

1.2 This test method can be used for silicon in which the dopant concentrations are less than 0.2% (1 by 1020 atoms/cm³) for antimony, arsenic or phosphorus. This test method is especially applicable for silicon where boron, the p-type dopant, is an unintentional contaminant at trace levels (<5 by 1014 atoms/cm³).

1.3 This test method can be used for silicon in which the boron contamination is greater than two times the SIMS detection limits that is approximately between 5 by 1012 atoms/cm³ and 5 by 1013 atoms/cm³ depending upon the instrumentation type described herein.

1.4 In principle, different sample surfaces can be used, but the precision estimate was taken from data on polished etched surfaces.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

This standard was transferred to SEMI (www.semi.org) May 2003.

1.1 This test method covers the determination of total trace boron contamination in the bulk of single crystal, heavily doped n-type silicon substrates using secondary ion mass spectrometry (SIMS).

1.2 This test method can be used for silicon in which the dopant concentrations are less than 0.2% (1 by 1020 atoms/cm³) for antimony, arsenic or phosphorus. This test method is especially applicable for silicon where boron, the p-type dopant, is an unintentional contaminant at trace levels (∧lt;5 by 1014 atoms/cm³).

1.3 This test method can be used for silicon in which the boron contamination is greater than two times the SIMS detection limits that is approximately between 5 by 1012 atoms/cm³ and 5 by 1013 atoms/cm³ depending upon the instrumentation type described herein.

1.4 In principle, different sample surfaces can be used, but the precision estimate was taken from data on polished etched surfaces.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.