+1 888 608-7511
Need help finding a standard?
Help Desk
This standard was transferred to SEMI (www.semi.org) May 2003.
1.1 These test methods cover techniques for determining the crystallographic orientation of a surface which is roughly parallel to a low-index atomic plane in single crystals used primarily for semiconductor devices.
1.2 Two types of test methods are covered as follows:
1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. Specific hazard statements are given in Section 6.
This standard was transferred to SEMI (www.semi.org) May 2003.
1.1 These test methods cover techniques for determining the crystallographic orientation of a surface which is roughly parallel to a low-index atomic plane in single crystals used primarily for semiconductor devices.
1.2 Two types of test methods are covered as follows:
1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. Specific hazard statements are given in Section 6.
Failed to load document history.
| Publish Date | Document Id | Type | View |
|---|
