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BSI BS ISO 14237:2010

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
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BSI BS ISO 14237:2010

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

PUBLISH DATE 2010
PAGES 30
BSI BS ISO 14237:2010

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.

SDO BSI: British Standards Institution
Document Number ISO 14237
Publication Date Aug. 31, 2010
Language en - English
Page Count
Revision Level
Supercedes
Committee CII/60
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