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BSI BS ISO 21466:2019

Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM
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BSI BS ISO 21466:2019

Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM

PUBLISH DATE 2019
PAGES 56
BSI BS ISO 21466:2019

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

SDO BSI: British Standards Institution
Document Number ISO 21466
Publication Date Dec. 18, 2019
Language en - English
Page Count 56
Revision Level
Supercedes
Committee CII/9
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