ISO 21859:2019

Current Revision
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

PUBLISH DATE 2019
ISO 21859:2019

This document specifies a test method for **plasma resistance** of ceramic components in semiconductor manufacturing equipment.

It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

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