ISO 23170:2022

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Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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ISO 23170:2022

Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

PUBLISH DATE 2022
ISO 23170:2022

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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