ISO 25164:2026

Current Revision
Physical vapor deposition coatings - Magnetron sputtering deposition of TiAlSiN thin films - Specification

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ISO 25164:2026

Physical vapor deposition coatings - Magnetron sputtering deposition of TiAlSiN thin films - Specification

PUBLISH DATE 2026
ISO 25164:2026

This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.

This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.

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