ISO 13424:2013

Current Revision
Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of results of thin-film analysis

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ISO 13424:2013

Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of results of thin-film analysis

PUBLISH DATE 2013
ISO 13424:2013

ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS.

These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by:

  • angle-resolved XPS,
  • XPS sputter-depth profiling,
  • peak-shape analysis, and
  • variable photon energy XPS.
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