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IEC 62040-5-3 Ed. 1.0 b:2016
Uninterruptible power systems (UPS) - Part 5-3: DC output UPS - Performance and test requirements
IEC 62040-5-3 Ed. 1.0 b:2016

Uninterruptible power systems (UPS) - Part 5-3: DC output UPS - Performance and test requirements

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IEC 62041 Ed. 3.0 b:2017
Transformers, power supplies, reactors and similar products - EMC requirements
IEC 62041 Ed. 3.0 b:2017

Transformers, power supplies, reactors and similar products - EMC requirements

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IEC 62044-1 Ed. 1.0 b:2002
Cores made of soft magnetic materials - Measuring methods - Part 1: Generic specification
IEC 62044-1 Ed. 1.0 b:2002

Cores made of soft magnetic materials - Measuring methods - Part 1: Generic specification

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IEC 62044-2 Ed. 1.0 b:2005
Cores made of soft magnetic materials - Measuring methods - Part 2: Magnetic properties at low excitation level
IEC 62044-2 Ed. 1.0 b:2005

Cores made of soft magnetic materials - Measuring methods - Part 2: Magnetic properties at low excitation level

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IEC 62044-3 Ed. 2.0 b:2023
Cores made of soft magnetic materials - Measuring methods - Part 3: Magnetic properties at high excitation level
IEC 62044-3 Ed. 2.0 b:2023

Cores made of soft magnetic materials - Measuring methods - Part 3: Magnetic properties at high excitation level

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IEC 62046 Ed. 2.0 b:2026
Safety of machinery - Application of protective equipment to detect the presence of persons
IEC 62046 Ed. 2.0 b:2026

Safety of machinery - Application of protective equipment to detect the presence of persons

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IEC 62047-1 Ed. 2.0 b:2016
Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
IEC 62047-1 Ed. 2.0 b:2016

Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions

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IEC 62047-10 Ed. 1.0 b:2011
Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
IEC 62047-10 Ed. 1.0 b:2011

Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials

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IEC 62047-11 Ed. 1.0 b:2013
Semiconductor devices - Micro-electromechanical devices - Part 11: Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems
IEC 62047-11 Ed. 1.0 b:2013

Semiconductor devices - Micro-electromechanical devices - Part 11: Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems

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IEC 62047-12 Ed. 1.0 b:2011
Semiconductor devices - Micro-electromechanical devices - Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures
IEC 62047-12 Ed. 1.0 b:2011

Semiconductor devices - Micro-electromechanical devices - Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures

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IEC 62047-13 Ed. 1.0 b:2012
Semiconductor devices - Micro-electromechanical devices - Part 13: Bend - and shear - type test methods of measuring adhesive strength for MEMS structures
IEC 62047-13 Ed. 1.0 b:2012

Semiconductor devices - Micro-electromechanical devices - Part 13: Bend - and shear - type test methods of measuring adhesive strength for MEMS structures

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IEC 62047-14 Ed. 1.0 b:2012
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials
IEC 62047-14 Ed. 1.0 b:2012

Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials

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IEC 62047-16 Ed. 1.0 b:2015
Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods
IEC 62047-16 Ed. 1.0 b:2015

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods

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IEC 62047-17 Ed. 1.0 b:2015
Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films
IEC 62047-17 Ed. 1.0 b:2015

Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films

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IEC 62047-18 Ed. 1.0 b:2013
Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials
IEC 62047-18 Ed. 1.0 b:2013

Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials

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IEC 62047-19 Ed. 1.0 b:2013
Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
IEC 62047-19 Ed. 1.0 b:2013

Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses

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IEC 62047-2 Ed. 1.0 b:2006
Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials
IEC 62047-2 Ed. 1.0 b:2006

Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials

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IEC 62047-20 Ed. 1.0 b:2014
Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
IEC 62047-20 Ed. 1.0 b:2014

Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes

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IEC 62047-21 Ed. 1.0 b:2014
Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials
IEC 62047-21 Ed. 1.0 b:2014

Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials

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IEC 62047-22 Ed. 1.0 b:2014
Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates
IEC 62047-22 Ed. 1.0 b:2014

Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates

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IEC 62047-25 Ed. 1.0 b:2016
Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area
IEC 62047-25 Ed. 1.0 b:2016

Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area

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IEC 62047-26 Ed. 1.0 b:2016
Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures
IEC 62047-26 Ed. 1.0 b:2016

Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures

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IEC 62047-27 Ed. 1.0 en:2017
Semiconductor devices - Micro-electromechanical devices - Part 27: Bond strength test for glass frit bonded structures using micro-chevron-tests (MCT)
IEC 62047-27 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 27: Bond strength test for glass frit bonded structures using micro-chevron-tests (MCT)

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IEC 62047-28 Ed. 1.0 en:2017
Semiconductor devices - Micro-electromechanical devices - Part 28: Performance testing method of vibration-driven MEMS electret energy harvesting devices
IEC 62047-28 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 28: Performance testing method of vibration-driven MEMS electret energy harvesting devices

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IEC 62047-29 Ed. 1.0 en:2017
Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature
IEC 62047-29 Ed. 1.0 en:2017

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature

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